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Summary

Professional Skills including: 1. Thin Film Deposition: Plasma-Enhanced Chemical Vapor Deposition (a-Si:H, silicon oxide nitride, silicon nitride), Atomic Layer Deposition (a-Al2O3, a-HfO2), Hot Wire Chemical Vapor Deposition (a-Si, silicon nitride), Thermal Evaporation Deposition (Au, Al, Ag etc), E-beam Evaporation (TiO2, etc) 2. Device Fabrication: Photolithography and Mask-design, General wet bench processing, Plasma dry etching, Rapid Thermal Annealing 3. Characterization and Analysis: PL-imaging, QSSPC, u-PCD, CDI, I-V, Contact & Contactless C-V, Corona Charging, GDOES, Profilometer, Ellimpsometry, FTIR, AFM, SEM, Hall effect, UV-Vis optical transmission and reflection 4.Device Simulation: AFORS-HET, PC1D 5.Research tools: Matlab, Origin, Auto-CAD

Experiences

Current Experience

  • Doctoral Candidate
    Since February 2014
    Surface passivation on c-Si solar cells

Past Experience

  • Visiting Doctoral Candidate
    March 2016 --- June 2016
    1 ALD deposited HfO2 passivation on c-Si 2 HfO2 passivation on black silicon Passivation properties are characterized by QSSPC, Contctless CV, Corona charging, Ellimpsometry, SEM and GDOES

  • Visiting Doctoral Candidate
    April 2015 --- November 2015
    1 PECVD deposited a-Si:H/a-SiNx:H stacks passivation on c-Si 2 PECVD deposited a-SiOxNy:H/a-SiNx:H stacks passivation on c-Si Passivation properties characterized by PL-imaging, QSSPC, Contact CV, Ellimpsometry, FTIR and GDOES (glow discharge optical emitted spectrometer)

  • R&D engineer
    January 2012 --- February 2014
    High efficiency solar cells (based on III-V, II-V and Si/Ge) development: 1. Device processing development of single and multi-junction solar cells(design of lithography mask, optimization of ARC and metal contact) 2. Responsible for process integration and control

Knowledge

LinkedIn Assessment :
Materials ScienceCharacterizationResearchR&DScanning Electron MicroscopyPhysicsThin FilmsMaterialsPassivationSilicon PhotonicsGaAsSilicon Surface PassivationAtomic Layer Deposition

Skills and Expertise

Self Assessment :
1. Thin Film Deposition: Plasma-Enhanced Chemical Vapor Deposition (a-Si:Hsilicon oxide nitridesilicon nitride)Atomic Layer Deposition (a-Al2O3a-HfO2)Hot Wire Chemical Vapor Deposition (a-SiThermal Evaporation Deposition (AuAlAg etc)E-beam Evaporation (TiO2etc) 2. Device Fabrication: Photolithography and Mask-designGeneral wet bench processingPlasma dry etchingRapid Thermal Annealing 3. Characterization and Analysis: PL-imagingQSSPCu-PCDCDII-VContact & Contactless C-VCorona ChargingGDOESProfilometerEllimpsometryFTIRAFMSEMHall effectUV-Vis optical transmission and reflection 4.Device Simulation: AFORS-HETPC1D 5.Research tools: MatlabOriginAuto-CAD

Education

  • Doctor of Philosophy (Ph.D.) in Surface passivation of silicon solar cells from Norwegian University of Science and Technology (NTNU) in 2017
  • Master’s Degree in HIT solar cell from Shanghai Jiao Tong University in 2012

Languages

BrightOwl Assessment:
Self Assessment:
English
Professional Proficiency

Area / Region

Trondheim, Norway

Others

Driving License
  • No